The US Air Force Research Lab (AFRL) has awarded the new "High-K Dielectric Research for the Development of High-Performance, Compact Capacitors for Pulse Forming" to American Semiconductor Inc. (Boise, ID). The research will be conducted to develop applied technology in high-k dielectric materials to demonstrate substantial improvement in capacity, voltage breakdown and dissipation factor in advanced capacitor prototypes.
Pulse power capacitors are an enabling technology for all future weapon systems the US Department of Defense plans to pursue. Additionally, high-k material performance is a key technology requirement for future semiconductor devices such as the next generation of American Semiconductor's recently announced Flexfet™ SOI technology.
